• Technical Conference:  10 – 15 May 2020
  • Exhibition: 12 – 14 May 2020

2019 Applications & Technology Topical Reviews

The Applications & Technology Topical Reviews emphasize significant recent advances in the application of photonics technologies to address current real world problems. Presentations by leaders in their fields highlight how important advances are being realized in areas from metasurfaces to novel light sources.

Advanced Design, Imaging and Process Technologies for Next Generation Semiconductors

Topical Review on Silicon Photonics

Progress in Semiconductor Laser Technology

Topical Review Sessions on Flat Optics

 

Advanced Design, Imaging and Process Technologies for Next Generation Semiconductors

Organizers

Will Conley, Cymer, USA
Jae Won Hahn, Yonsei University, South Korea

The successful integration of design, layout, imaging solutions and advances in process technologies continue to provide viable working solutions to continue the advancement of logic and memory technologies. This session will highlight recent advances in design layout to on wafer imaging to on wafer final etch of circuitry. Areas of interest include layout ground rules, use of machine learning throughout the design, verification cycle and the application to imaging solutions through pupil and mask optimization (SMO). Insight into metrology issues, scanner/source (laser) improvements and the integration of etch processes will be reviewed.

 

Topical Review on Silicon Photonics

Organizer

Long Chen, Acacia Communications, USA
Amy Foster, Johns Hopkins University, USA

Over the past few decades, silicon photonics technology has matured from one-off demonstrations on optical tables to commercial products in applications generally involving information transfer. The advancement of the field is a result of many fantastic demonstrations by the research community (academic, government, and industry) as well as the establishment of several silicon photonic foundries where researchers can share real estate in multi-project wafers to manufacture prototype silicon photonic devices up to the sub-system level of integration. The maturity of the field and the increased accessibility of the manufacturing have resulted in a very exciting and application-diverse field of silicon photonics. In this topical review, we will highlight work being done all over the field of silicon photonics with diverse fabrication approaches and application space. We will highlight ongoing efforts at all levels of technology readiness, from basic science to commercial products. Many silicon-based platforms including crystalline, poly-, and amorphous silicon, silicon nitride, silicon germanium, silicon-rich nitride, and silicon oxynitride will be highlighted.

 

Invited Speakers

Chris Doerr, Acacia Communications, Inc., USA
David Moss, Swinburne University of Technology, Australia
Graham Reed, University of Southampton, UK
Alex Wright, Ayar Labs, Inc., USA
Linjie Zhou, Shanghai Jiao Tong University, China

 

Progress in Semiconductor Laser Technology

Organizer

Edik Rafailov, Aston University, UK

For over half a century, laser technology has undergone a technological revolution. These technologies, particularly semiconductor lasers, have reached a mature stage and transformed from a fundamental area of research into emerging applications and products. This sessionwill present recent progress in the development of novel light sources in a broad wavelength range along with their applications (i.e., lighting, sensing, biophotonics etc).

Invited Speakers

Richard Hogg, Glasgow University, UK
Sven Höfling, University of Würzburg, Germany
Takeo Kageyama, QD Laser Ltd, Japan
Mike Leszczynski, Institute of High Pressure Physics Warsaw, Poland

 

Topical Review Sessions on Flat Optics

Organizer

Federico Capasso, Harvard University, USA

Flat Optics I: Physics of metasurfaces and their applications

Metasurfaces enable an unprecedented platform to explore light-matter interaction. This session covers aspects of interesting fundamental topics in metasurfaces, including but not limited to zero index materials, dispersion engineering, ultrafast dynamics, nonreciprocity, nonlinearity and quantum metasurfaces.

Invited Speakers

Vladimir M. Shalaev, Purdue University, USA
Yuri Kivshar, Australian National University, Australia
Mikhail Belkin, University of Texas at Austin, USA

 

Flat Optics II: Metasurface optical components

Metasurfaces enable the redesign of optical components into thin, planar and multifunctional elements, promising a major reduction in footprint and system complexity as well as the introduction of new optical functions. This session will focus on metasurface-based optical devices and systems for a wide range of applications and will include high-performance components designed by inverse methods.

Invited Speakers

Wei Ting Chen, Harvard University, USA
Jonathan Fan, Stanford University, USA
Byoungho Lee, Seoul National University, USA

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