Metalens with fixed-gap nanopillars release fabrication challenges in photolithography on CMOS platform. Their performances are investigated through simulation, and the characterization results of metalens patterned directly on 12-inch glass-wafer via immersion lithography are presented.
Authors:Yuan Hsing Fu/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Nanxi Li/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Qize Zhong/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Yuan Dong/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Ting Hu/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Dongdong Li/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Zhengji Xu/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Yanyan Zhou/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Keng Heng Lai/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Vladimir Bliznetsov/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Hou-Jang Lee/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Wei Loong Loh/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Shiyang Zhu/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Qunying Lin/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research) Navab Singh/Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research)