Michael Titze, Purdue University, USA
Stefano Lagomarsino, Universitaet Siegen, Germany
Mason Marshall, National Institute of Standards & Technology, USA
Solid-state based quantum computing relies on artificial atoms, often realized through embedding impurity atoms in an otherwise clean crystal environment. While incorporation of atoms during crystal growth can give rise to high-quality photon emitters, the lack of positional control makes scaling of this approach exceptionally difficult. Through the use of focused ion beam implantation positional accuracy <(50 nm)3 can be achieved, sufficient for integration of emitters into photonic nanostructures. Tuning of the optical properties of emitters is achieved by adapting the ion species to the application. Current challenges in the field lie in the typically low ratio of optically active emitters to implanted ions preventing fully deterministic creation of emitters, as well as mitigation of damage introduced during the ion implantation.
This special session will focus on applications in solid state quantum optics realized using focused ion beam implantation and explore pathways of improving emitter yield and damage mitigation strategies.
Jennifer Choy, University of Wisconsin-Madison, USA
Steven Cundiff, University of Michigan, USA
Kai-Mei Fu, University of Washington, USA
Michael Hollenbach, Helmholtz-Zentrum Dresden-Rossendorf, Germany
Hebin Li, Florida International University, USA
Andrew Mounce, Sandia National Laboratory, USA
Meenakshi Singh, Colorado School of Mines, USA
Jelena Vuckovic, Stanford University, USA