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The Optical Society Announces 2015 Class of Senior Members

MEDIA ADVISORY

11 May 2015

Contact:
OSA Media Relations
mediarelations@osa.org

The Optical Society Announces 2015 Class of Senior Members

WASHINGTON — The Optical Society (OSA) Board of Directors is pleased to announce the approval of 135 new Senior Members — an OSA Membership distinction that provides well-established individuals with the opportunity to request a designation that recognizes their experience and professional accomplishments or service within the field of optics and photonics. The 135 Senior Members were announced today at CLEO 2015. A listing of the newly inducted OSA Senior Members appears below.

“On behalf of The Optical Society, I would like to congratulate our newly elected Senior Members,” stated Philip Russell, 2015 President, The Optical Society Board of Directors. “Our Senior Members come from all over the world and represent the three pillars of our Society – academic research, science education and industry.”

To qualify for Senior Membership, individuals must have at least ten years of significant professional experience in the field, an active OSA Membership and two endorsement statements from current OSA Members. Requests are reviewed by OSA’s Member and Education Services Council, which then recommends candidates to the Board of Directors for approval.
 
Senior Members receive the full complement of OSA Individual Member benefits and services, plus:
 Special Recognitions – Senior Members are identified in the OSA Member Directory, on OSA.org and during OSA-hosted events.
• Announcements – Newly-approved Senior Members are announced in: Optics & Photonics News, the OSA Member e-newsletter and a press release.
• Senior Member Certificate and Lapel Pin – Recognition materials are distributed upon request approval.
• Letter of Recognition – Approved Senior Members may request that a confirmation letter be sent to their employer.

Following is an alphabetical listing of the 135 Senior Members announced at CLEO 2015:

• Amin Abdolvand, University of Dundee, United Kingdom
• Ibrahim Abdulhalim, Ben Gurion University of the Negev, Israel
• Fatkhulla Abdullaev, International Islamic University of Malaysia, Malaysia
• Les Allen, United Kingdom
• Victor Apollonov, Russian Academy of Sciences, Russian Federation
• Jun Arai, NHK Science & Technology Research Laboratories, Japan
• Mathieu Aubailly, Optonicus, LLC., USA
• John Barrera Ramírez, Universidad de Antioquia, Colombia
• Patricia Bath, The American Institute for the Prevention of Blindness, USA
• Mikhail Belkin, University of Texas at Austin, USA
• Tiziana Bond, Lawrence Livermore National Laboratory, USA
• Edward Buckley, Qualcomm, Inc., USA
• Vladimir Burdin, Povolzhskiy State University, Russian Federation
• Miguel Cervantes-Montoya, Universidad de Sonora, Mexico
• Patrick Chimfwembe, Alcatel-Lucent, Canada
• SangYeon Cho, New Mexico State University, USA
• Jiri Ctyroky, Institute of Photonics & Electronics, Czech Republic
• Neda Cvijetic, NEC Laboratories America Inc., USA
• Peter de Groot, Zygo Corporation, USA
• Jean-Miche Di Nicola, Lawrence Livermore National Laboratory, USA
• Charles DiMarzio, Northeastern University, USA
• Peter Dombi, Wigner Research Centre for Physics, Hungary
• Fabrizio Frezza, Sapienza-Università di Roma, Italy
• Teruo Fujita, Fukui University of Technology, Japan
• Hernando Garcia, Southern Illinois University-Edwardsville, USA
• Pascuala Garcia-Martinez, Universitat de València, Spain
• Jerome Genest, L'Université Laval, Canada
• Des Gibson, University of the West of Scotland, United Kingdom
• Antoine Godard, ONERA - The French Aerospace Lab, France
• Lynford Goddard, University of Illinois at Urbana-Champaign, USA
• Kenneth Grant, Defence Science & Technology Organisation, Australia
• Erwin Hack, Swiss Federal Laboratories for Material Science and Technology, Switzerland 
• Seunghoon Han, Samsung Advanced Institute of Technology, South Korea
• Sivanandan Harilal, Pacific Northwest National Laboratory, USA
• Jian-Jun He, Zhejiang University, China
• Holger Hofmann, Hiroshima University, Japan
• Steve Hranilovic, McMaster University, Canada
• Kevin Hsu, Exalos, USA
• Yen-Chieh Huang, National Tsing Hua University, Taiwan
• Peter Huggard, Rutherford Appleton Laboratory (RAL), United Kingdom
• Andrey Ionin, P.N. Lebedev Physical Institute RAS (LPI RAS), Russian Federation
• Soren Isaksen, NKT Holding A/S, Denmark
• M. Saif Islam, University of California-Davis, USA
• Faquir Jain, University of Connecticut, USA
• Vakhtang Jandieri, Free University of Tbilisi, Georgia
• Animesh Jha, University of Leeds, United Kingdom
• Safa Kasap, University of Saskatchewan, Canada
• Alper Kiraz, Koç University, Turkey
• Jonathan Klamkin, Boston University, USA
• Frank Knappe, 8.2 Consulting AG, USA
• Takayoshi Kobayashi, The University of Electro-Communications, Japan
• Michael Komodromos, Frederick University, Cyprus
• Ivica Kopriva, Ruđer Bošković Institute, Croatia
• Brian Kruschwitz, University of Rochester, USA
• Waruna Kulatilaka, Texas A&M University, USA
• Taha Landolsi, American University of Sharjah, United Arab Emirates
• Dabing Li, Changchun Institute of Optics, Fine Mechanics and Physics, China
• Xun Li, McMaster University, Canada
• Wojciech Lipinski, The Australian National University, Australia
• Tzu-Ming Liu, National Taiwan University, Taiwan
• Xu Liu, Zhejiang University, China
• David Loshin, Nova Southeastern University, USA
• Mohd Mahdi, Universiti Putra Malaysia, Malaysia
• Donald McCarthy, USA
• Robert McLeod, University of Colorado-Boulder, USA
• Leon McLin, Jr., Air Force Research Laboratory, USA
• Gennady Medvedkin, AltaSens, USA
• Igor Melnikov, Russian Federation
• M. Pinar Menguc, Özyeğin Universitesi, Turkey
• Lino Misoguti, Universidade de São Paulo-Instituto de Física de São Carlos, Brazil
• Hideki Miyazaki, National Institute for Materials Science, Japan
• Andrzej Miziolek, U.S. Army Research Laboratory, USA
• Ahmed Morshed, Ain Shams University, Egypt
• Ramakrishnan Mukundan, University of Canterbury, New Zealand
• Pascual Munoz, Universitat Politècnica de València, Spain
• Amir Nejadmalayeri, Samsung Electronics, South Korea
• Arup Neogi, University of North Texas, USA
• Sile Nic Chormaic, Okinawa Institute of Science and Technology, Japan
• Naveen Nishchal, Indian Institute of Technology-Patna, India
• Rogerio Nogueira, Instituto de Telecomunicações, Portugal
• Roberto Osellame, Istituto di Fotonica e Nanotecnologie, Italy
• Gonzalo Paez, Centro de Investigaciones en Optica A.C., Mexico
• Kyung Hyun Park, Electronics and Telecommunications Research Institute, South Korea
• Stevan Plote, BTI Systems, USA
• Gernot Pomrenke, The Air Force Office of Scientific Research, USA
• Bertrand Poumellec, The French National Centre for Scientific Research, France
• Michelle Povinelli, University of Southern California, USA
• Zhi-mei Qi, Chinese Academy of Sciences, China
• Faiz Rahman, Ohio University, USA
• Milind Rajadhyaksha, Memorial Sloan Kettering Cancer Center, USA
• Ronald Reano, Ohio State University, USA
• Bojan Resan, JSDU, Switzerland
• Fernando Romero-Borja, Houston Community College, USA
• Pablo Ruiz, Loughborough University, United Kingdom
• Leslie Rusch, L'Université Laval, Canada
• Mohammed Saad, Thorlabs, Inc., USA
• Jayanta Sahu, University of Southampton, United Kingdom
• Kazuaki Sakoda, National Institute for Materials Science, Japan
• Thomas Schneider, Hochschule für Telekommunikation Leipzig, Germany
• Wolf Seelert, Coherent, Inc., Germany
• Taro Sekikawa, Hokkaido University, Japan
• Chandra Shakher, Indian Institute of Technology-Delhi, India
• Shiv Sharma, Hawai'i Institute of Geophysics and Planetology, USA
• Sherif Sherif, University of Manitoba, Canada
• Kazuo Shiraishi, Utsunomiya University, Japan
• Ghanshyam Singh, Malaviya National Institute of Technology-Jaipur, India
• Anthony Smart, Scattering Solutions, USA
• Brian Stamper, Nikon Research Corporation of America, USA
• Ove Steinvall, Swedish Defence Research Agency, Sweden
• Karl Stetson, Karl Stetson Associates, LLC., USA
• William Stoner, Liedos, USA
• Nobuo Sugimoto, National Institute for Environmental Studies, Japan
• Hong-Bo Sun, Jilin University, China
• Eiji Takahashi, RIKEN, Japan
• Antonio Teixeira, Universidade de Aveiro, Portugal
• Simon Thibault, L'Université Laval, Canada
• Sergei Tretyakov, Aalto University, Finland
• Roelof van Silfhout, University of Manchester, United Kingdom
• Shailendra Varshney, Indian Institute of Technology-Kharagpur, India
• Alan Wang, Oregon State University, USA
• Douglas Werner, Pennsylvania State University, USA
• Robert Woodruff, University of Colorado-Boulder, USA
• C. Benjamin Wooley, Vistakon, USA
• Chien-Jang Wu, National Taiwan Normal University, Taiwan
• Peng Xi, Peking University, China
• Min Xu, Fairfield University, USA
• S.J. Xu, University of Hong Kong, USA
• Araz Yacoubian, USA
• Azer Yalin, Colorado State University, USA
• Walid Younes Mohamed, Cairo University, Egypt
• Baohong Yuan, University of Texas-Arlington, USA
• Aramais Zakharian, Corning Incorporated, USA
• Roger Zemp, University of Alberta, Canada
• A. Ping Zhang, Hong Kong Polytechnic University, Hong Kong
• Yan Zhang, Capital Normal University, China

About The Optical Society

Founded in 1916, The Optical Society (OSA) is the leading professional organization for scientists, engineers, students and entrepreneurs who fuel discoveries, shape real-life applications and accelerate achievements in the science of light. Through world-renowned publications, meetings and membership initiatives, OSA provides quality research, inspired interactions and dedicated resources for its extensive global network of optics and photonics experts. OSA is a founding partner of the National Photonics Initiative and the 2015 International Year of Light. For more information, visit www.osa.org.

About CLEO

With a distinguished history as the industry's leading event on laser science, the Conference on Lasers and Electro-Optics (CLEO) is the premier international forum for scientific and technical optics, uniting the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications. CLEO: Expo showcases the latest products and applications from more than 300 participating companies from around the world, providing hands-on demonstrations of the latest market innovations and applications. The Expo also offers valuable on-floor programming, including Market Focus and the Technology Transfer program.

Sponsored by the American Physical Society's (APS) Laser Science Division, IEEE Photonics Society and The Optical Society (OSA), CLEO provides the full range of critical developments in the field, showcasing the most significant milestones from laboratory to marketplace. With an unparalleled breadth and depth of coverage, CLEO connects all of the critical vertical markets in lasers and electro-optics. For more information, visit www.cleoconference.org. CLEO 2015 takes place 10-15 May 2015 at the San Jose Convention Center, San Jose, California, USA. Follow developments and updates on CLEO 2015 on Twitter @CLEOConf, #CLEO15.

Media Registration: A media room for credentialed press and analysts will be located on-site in the San Jose Convention Center, 11-14 May 2015. Media interested in attending the event should register on the CLEO website media center: www.cleoconference.org/home/news-and-press/press-and-analysts/Media Center.


Media Contacts:
Rebecca B. Andersen                                                                              Melanie Salemno
The Optical Society                                                                                  The Optical Society
randersen@osa.org                                                                                 msalemno@osa.org
+1 202.416.1443                                                                                     +1 202.416.1947
 



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