CLEO/QELS is presented by:
Short Courses
SC247 Ultrafast Optics: Nanoscale Microscopy, Metrology and Patterning Using Compact and Large Scale Soft X-Ray Sources
Monday, May 5, 9:00 a.m. - 12:00 p.m. David Attwood¹, Jorge J. Rocca², Margaret Murnane³; ¹Lawrence Berkeley Natl. Lab, USA, ²Colorado State Univ., USA, ³Univ. of Colorado at Boulder, USA
Level: Beginner (no background or minimal training is necessary to understand course materials
Course Description Microscopy has been a critical enabling technology for understanding materials and biological systems since its invention. However, as the size of the most advanced electronic circuits and nanoscale machines continues shrink to very short wavelengths, conventional optical technologies are rapidly reaching their limits. To further increase resolution, the much shorter wavelength of moderate-energy electrons can be used. Electron microscopes are limited by the mean-free-path of the charged particles; therefore, this technique is restricted to imaging thin samples, typically < 500 nm. Light in the Extreme Ultraviolet (EUV) and Soft-X-Ray (SXR) regions of the spectrum (wavelengths approximately 1 to 50 nm) is positioned to become a key element in emerging technologies that are of critical importance to the national economy. Moreover, the emergence of nanometer-scale science and technology increases the need for short wavelength analytic tools with similar wavelengths and resolutions. In life sciences, for example, soft-x-ray microscopy will enable a new generation of high-contrast microscopes with spatial resolution < 20nm.
This course will discuss state-of-the-art applications of soft x-rays in high resolution biological microscopy, metrology, materials characterization and patterning using table-top, synchrotron and free-electron-based light sources. Numerous core-level absorption edges and widely varying elemental absorption cross sections in the SRX region provide excellent inherent image contrast, particularly for biological imaging in the “water window” (300 eV - 500eV) region of the spectrum, or for magnetic domain imaging around 800 eV. We will discuss soft-x-ray imaging techniques using diffractive optics such as Fresnel zone plates that are capable of reaching image resolutions as high as 15 nm. We will also discuss new lensless diffractive microscopes and coherent x-ray beams that have important applications in time-resolved imaging.
Benefits and Learning Objectives This course should enable you to:
Intended Audience This course is aimed at engineers and scientists from industry and academe, including graduate students, who are interested in understanding the applications of short-wavelength light in high-resolution biological and materials imaging. Information on sources, optics and applications is intended to quickly update the audience on state-of-the-art, coherent, short-wavelength sources as well as demonstrated technological applications.
Instructor Biographies David Attwood is a professor at the University of California at Berkeley and a senior scientist at Lawrence Berkeley National Lab. He received a bachelor’s degree in engineering science from Hofstra University in 1963, a master’s degree from Northwestern University in 1965, and completed his doctorate in applied physics at New York University in 1972. He then worked at Lawrence Livermore National Lab and then Lawrence Berkeley National Lab, where he founded the Center for X-Ray Optics in 1983. He was scientific director of the Advanced Light Source from 1985 to 1988, and co-director of the EUV Virtual National Lab from 1997 to 2002. He joined the faculty of the University of California at Berkeley in 1986, where he co-founded the applied science and technology doctorate program and joined the Electrical Engineering and Computer Science Department 1993. He is a fellow of the American Physical Society and of the Optical Society of America. His interests include the generation of extreme ultraviolet and soft x-ray radiation, applications to soft x-ray microscopy and EUV lithography, and the coherence properties of short wavelength radiation sources.
Jorge J. Rocca is a professor at Colorado State University. His research interests are in the development and physics of compact EUV and Soft X-Ray lasers, and their applications. He has conducted research and published more than 170 papers in peer review journals in topics related to short wavelength lasers and plasmas. In 1994 his research group demonstrated large EUV laser amplification in a discharge-created plasma, result that lead to the development of the first high average power tabletop coherent source in this spectral region. He was a National Science Foundation Presidential Young Investigator for 1985-1990. He is a fellow of the Optical Society of America, Institute of Electrical and Electronic Engineers, and American Physical Society. He has served as associate editor of the IEEE Journal of Quantum Electronics and guest editor of the IEEE Journal of Selected Topics in Quantum Electronics.
Margaret Murnane is a Fellow of JILA and a member of the faculty in the Departments of Physics and ECE at the University of Colorado. She received her doctorate in physics from the University of California at Berkeley in 1989. Her research interests include the development of ultrafast laser and x-ray sources, as well as pioneering the application of table-top coherent x-ray beams in imaging, holography, diffractive microscopy, photoacoustic metrology, surface science, molecular science, and radiation chemistry. She is a member of IEEE, OSA, APS, ACS and AWIS; she is a fellow of the Optical Society of America and the American Physical Society and is a member of the U.S. National Academy of Sciences.
