CLEO/QELS is presented by:
High-Order Harmonic Generation
Below are select presentations on this topic. To find additional relevant papers and sessions, visit the online conference program. There are no video segments available for high-order harmonic generation.
JFD1 • The Physics of High-Order Harmonic Generation Friday, May 9, 10:15 a.m.–11:15 a.m., Room C3 and C4 Anne L'Huillier; Lund Univ., Sweden. This tutorial will describe the field of high-order harmonics in gases, including attosecond pulse generation. JWB4 • High Order Harmonic Generation in High Intensity Laser-Solid Interactions Wednesday, May 7, 2:15 p.m.–2:45 p.m., Room C3 and C4 Fabien Quéré¹, C. Thaury¹, H. George¹, J. P. Geindre², A. Lévy¹, T. Ceccotti¹, P. Monot¹, R. Marjoribanks³, P. Audebert², Ph. Martin¹; ¹Commissariat à l'Energie Atomique, DSM/DRECAM, CEN Saclay, France, ²Lab pour l'Utilisation des Lasers Intenses, Ctr. Natl. de la Recherche Scientifique, Ecole Polytechnique, France, ³Dept. of Physics and Inst. for Optical Sciences, Univ. of Toronto, Canada. We will discuss the two mechanisms involved in high-order harmonic generation from plasma mirrors, and show that they can be clearly identified experimentally. The phase and coherence properties of these harmonics will be analyzed.
CWA6 • Nanoscale Heat Transport Probed with Soft-X-Rays Wednesday, May 7, 2:45 p.m.–3:15 p.m., Ballroom A3 and A6 Mark Siemens¹, Qing Li¹, Margaret Murnane¹, Henry Kapteyn¹, Ronggui Yang¹, Keith Nelson²; ¹Univ. of Colorado, USA, ²MIT, USA. We characterize heat transport in nanostructures, using coherent soft-x-rays to probe thermal surface deformation. By varying the substrate temperature, we observe the transition from diffusive to quasi-ballistic heat transport regimes.
SC247 • Ultrafast Optics: Nanoscale Microscopy, Metrology and Patterning Using Compact and Large Scale Soft X-Ray Sources Monday, May 5, 9:00 a.m.–12:00 p.m. David Attwood¹, Jorge J. Rocca², Margaret Murnane³; ¹Lawrence Berkeley Natl. Lab, USA, ²Colorado State Univ., USA, ³Univ. of Colorado at Boulder, USA. Microscopy has been a critical enabling technology for understanding materials and biological systems since its invention. However, as the size of the most advanced electronic circuits and nanoscale machines continues shrink to very short wavelengths, conventional optical technologies are rapidly reaching their limits. To further increase resolution, the much shorter wavelength of moderate-energy electrons can be used. Electron microscopes are limited by the mean-free-path of the charged particles; therefore, this technique is restricted to imaging thin samples, typically < 500 nm. Light in the Extreme Ultraviolet (EUV) and Soft-X-Ray (SXR) regions of the spectrum (wavelengths approximately 1 to 50 nm) is positioned to become a key element in emerging technologies that are of critical importance to the national economy. Moreover, the emergence of nanometer-scale science and technology increases the need for short wavelength analytic tools with similar wavelengths and resolutions. In life sciences, for example, soft-x-ray microscopy will enable a new generation of high-contrast microscopes with spatial resolution < 20nm.